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SCI: Theses
The synthesis of thin alumina film by Plasma-Enhanced Atomic Layer Deposition (PE-ALD)
Publication:
The synthesis of thin alumina film by Plasma-Enhanced Atomic Layer Deposition (PE-ALD)
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Paramaporn_J.pdf
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Issued Date
2016
Resource Type
Thesis
Language
eng
File Type
application/pdf
Access Rights
Open Access
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ผลงานนี้เผยแพร่ภายใต้ สัญญาอนุญาตครีเอทีฟคอมมอนส์แบบ แสดงที่มา-ไม่ใช้เพื่อการค้า-ไม่ดัดแปลง 4.0 (CC BY-NC-ND 4.0)
Rights Holder(s)
Srinakharinwirot University
Suggested Citation
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IEEE
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Vancouver
Paramaporn Jitsopakul
(2016).
The synthesis of thin alumina film by Plasma-Enhanced Atomic Layer Deposition (PE-ALD).
Retrieved from:
https://hdl.handle.net/20.500.14740/46333
Title
The synthesis of thin alumina film by Plasma-Enhanced Atomic Layer Deposition (PE-ALD)
Alternative Title(s)
การเคลือบฟิล์มบางอลูมินาโดยการตกสะสมชั้นอะตอมแบบพลาสมา.
Author(s)
Paramaporn Jitsopakul
Advisor(s)
Duangkhae Bootkul
Saweat Intarasiri
ปรมาภรณ์ จิตโสภากุล
Organization
คณะวิทยาศาสตร์
Description
Thesis, (M.S. (Material Science)) -- Srinakharinwirot University, 2016.
Degree Name
M.S. (Material Science)
Degree Level
Masters
Degree Grantor(s)
Srinakharinwirot University
Thai Subject Heading(s)
Materials s
Thin films
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URI
https://hdl.handle.net/20.500.14740/46333
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SCI: Theses
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