Please use this identifier to cite or link to this item: https://ir.swu.ac.th/jspui/handle/123456789/15152
ชื่อเรื่อง: Ionized magnetron sputter deposition of hard nanocomposite TiN/amorphous-silicon nitride films
ผู้แต่ง: Phinichka N.
Chandra R.
Barber Z.H.
Keywords: Crystallography
Dislocations (crystals)
Elastic moduli
Film growth
Grain size and shape
Hardness
Magnetron sputtering
Nanostructured materials
Physical vapor deposition
Plasma enhanced chemical vapor deposition
Plasmas
Sputter deposition
Stoichiometry
Titanium alloys
Chemical stability
Ion fluxes
Nanoindentation
Operational parameters
Thin films
วันที่เผยแพร่: 2004
บทคัดย่อ: The deposition of Ti-Si-N films using separate Ti and Si targets in an Ar/N2 gas mixture was analyzed using ionized magnetron sputter deposition (IMSD). The effects of different operational parameters on film structure and mechanical properties were investigated using deposition under various conditions. X-ray diffraction was used to characterize crystallography, grain size and film texture such that addition of Si to TiN transformed (111)-oriented structure. The results show that hardness of films increased to as much as twice that of pure TiN films using nanoidentation.
URI: https://ir.swu.ac.th/jspui/handle/123456789/15152
https://www.scopus.com/inward/record.uri?eid=2-s2.0-3142518030&doi=10.1116%2f1.1690778&partnerID=40&md5=c180eda6374d50362780fbdf55ef74bd
ISSN: 7342101
Appears in Collections:Scopus 1983-2021

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