Publication: NO2-sensing properties of WO3 nanorods prepared by glancing angle DC magnetron sputtering
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Issued Date
2013
Resource Type
File Type
application/pdf
ISSN
9254005
Other identifier(s)
2-s2.0-84872517443
Rights Holder(s)
Scopus
Bibliographic Citation
Sensors and Actuators, B: Chemical. Vol 176, No. (2013), p.685-691
Suggested Citation
Horprathum M., Limwichean K., Wisitsoraat A., Eiamchai P., Aiempanakit K., Limnonthakul P., Nuntawong N., Pattantsetakul V., Tuantranont A., Chindaudom P. NO2-sensing properties of WO3 nanorods prepared by glancing angle DC magnetron sputtering. Sensors and Actuators, B: Chemical. Vol 176, No. (2013), p.685-691. doi:10.1016/j.snb.2012.09.077 Retrieved from: https://hdl.handle.net/20.500.14740/6812
Abstract
In this work, the NO2-sensing properties of the tungsten trioxide (WO3) nanorods prepared by dc magnetron sputtering with glancing-angle deposition (GLAD) technique are comparatively studied with that of WO3 thin film deposited by normal sputtering process. The crystal structure and morphologies were characterized by grazing-incidence X-ray diffraction and field emission scanning electron microscopy, respectively. As-deposited WO3 structure deposited at glancing angle of 85? exhibited amorphous crystal structure with uniform isolated columnar nanorod morphology with average length, diameter and spacing between nanorods of around 400 nm, 50 nm and 10 nm, respectively. Annealing at 400 and 500 ° resulted in polycrystalline phase and more porous nanorod network with very large effective surface area. The NO2 sensing response of WO3 nanorods was found to be higher than that of WO3 thin film by a factor of 2-5 depending on operating temperature and gas concentration. In addition, WO3 nanorod annealed at 500 ° exhibited an optimum response of ~27-2.0 ppm of NO2 at 250 °. Therefore, GLAD using reactive dc magnetron sputtering has been demonstrated as a practical method for fabrication of well-aligned metal oxide nanostructures and is potential for gas-sensing applications. © 2012 Elsevier B.V. All rights reserved.
Subject(s)
Amorphous materials
Annealing
Deposition
Field emission microscopes
Film preparation
Gas sensing electrodes
Magnetron sputtering
Metals
Nanorods
Nitrogen oxides
Scanning electron microscopy
Sputtering
Thin films
Tungsten
X ray diffraction
Crystal structure and morphology
Field emission scanning electron microscopy
Gas sensing applications
Glancing Angle Deposition
Glancing angle deposition technique
Grazing incidence X-ray diffraction
Reactive DC magnetron sputtering
Tungsten trioxide
Crystal structure
Annealing
Deposition
Field emission microscopes
Film preparation
Gas sensing electrodes
Magnetron sputtering
Metals
Nanorods
Nitrogen oxides
Scanning electron microscopy
Sputtering
Thin films
Tungsten
X ray diffraction
Crystal structure and morphology
Field emission scanning electron microscopy
Gas sensing applications
Glancing Angle Deposition
Glancing angle deposition technique
Grazing incidence X-ray diffraction
Reactive DC magnetron sputtering
Tungsten trioxide
Crystal structure