Publication: Effects of filtered cathodic vacuum arc deposition (FCVAD) conditions on photovoltaic TiO 2 films
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Issued Date
2014
Resource Type
File Type
application/pdf
ISSN
1694332
Other identifier(s)
2-s2.0-84903309650
Rights Holder(s)
Scopus
Bibliographic Citation
Applied Surface Science. Vol 310, (2014), p.266-271
Suggested Citation
Aramwit C., Intarasiri S., Bootkul D., Tippawan U., Supsermpol B., Seanphinit N., Ruangkul W., Yu L.D. Effects of filtered cathodic vacuum arc deposition (FCVAD) conditions on photovoltaic TiO 2 films. Applied Surface Science. Vol 310, (2014), p.266-271. doi:10.1016/j.apsusc.2014.01.097 Retrieved from: https://hdl.handle.net/20.500.14740/6273
Abstract
Titanium dioxide (TiO 2 ) films for photovoltaic applications were synthesized using filtered cathodic vacuum arc deposition (FCVAD) technique. Various deposition conditions were tested for an optimal film formation. The conditions included the oxygen (O 2 ) pressure which was varied from a base pressure 10 -5 to 10 -4 , 10 -3 , 10 -2 and 10 -1 Torr, sample holder bias varied using 0 or -250 V, deposition time varied from 10, 20 to 30 min, and deposition distance varied from 1 to 3 cm. The deposited films were also annealed and compared with unannealed ones. The films under various conditions were characterized using optical microscopy, scanning electron microscopy (SEM), atomic force microscopy (AFM), energy-dispersive X-ray spectroscopy (EDS) and Raman spectroscopy techniques. The film transparency increased and thickness decreased to a nanoscale with increasing of the O 2 pressure. The transparent deposited films contained stoichiometric titanium and oxygen under the medium O 2 pressure. The as-deposited films were TiO 2 containing some rutile but no anatase which needed annealing to form. © 2014 Elsevier B.V.
Subject(s)
Atomic force microscopy
Deposition
Energy dispersive spectroscopy
Films
Oxide minerals
Oxygen
Photovoltaic effects
Scanning electron microscopy
Vacuum applications
Vacuum technology
As-deposited films
Deposition conditions
Deposition time
Energy dispersive X ray spectroscopy
Film transparency
Filtered cathodic vacuum arc deposition
Photovoltaic applications
Titanium dioxides (TiO2)
Titanium dioxide
Deposition
Energy dispersive spectroscopy
Films
Oxide minerals
Oxygen
Photovoltaic effects
Scanning electron microscopy
Vacuum applications
Vacuum technology
As-deposited films
Deposition conditions
Deposition time
Energy dispersive X ray spectroscopy
Film transparency
Filtered cathodic vacuum arc deposition
Photovoltaic applications
Titanium dioxides (TiO2)
Titanium dioxide