Publication:
Fabrication and characterization of hydrophilic TiO2 thin films on unheated substrates prepared by pulsed DC reactive magnetron sputtering

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Issued Date

2010

Resource Type

Article

File Type

application/pdf

ISSN

16874110

DOI

10.1155/2010/841659

Other identifier(s)

2-s2.0-77956808686

Rights Holder(s)

Scopus

Bibliographic Citation

Journal of Nanomaterials. Vol 2010, No. (2010), p.-

Suggested Citation

Horprathum M., Chindaudom P., Limnonthakul P., Eiamchai P., Nuntawong N., Patthanasettakul V., Pokaipisit A., Limsuwan P. Fabrication and characterization of hydrophilic TiO2 thin films on unheated substrates prepared by pulsed DC reactive magnetron sputtering. Journal of Nanomaterials. Vol 2010, No. (2010), p.-. doi:10.1155/2010/841659 Retrieved from: https://hdl.handle.net/20.500.14740/7544

Title

Fabrication and characterization of hydrophilic TiO2 thin films on unheated substrates prepared by pulsed DC reactive magnetron sputtering

Author(s)

Horprathum M.
 Chindaudom P.
 Limnonthakul P.
 Eiamchai P.
 Nuntawong N.
 Patthanasettakul V.
 Pokaipisit A.
 Limsuwan P.

Abstract

TiO2 thin films were deposited on unheated silicon wafers (100) and glass slides by a pulsed DC reactive magnetron sputtering in an ultrahigh vacuum (UHV) system. The effects of both an operating pressure and deposition time on film structure, surface morphology, and optical property were studied. The film structure and microstructure were characterized by grazing-incidence X-ray diffraction (GIXRD) technique and transmission electron microscopy (TEM). The surface morphology was investigated by field emission scanning electron microscopy (FE-SEM). The optical property of the TiO2 thin films was determined by spectroscopic ellipsometry (SE). The water contact angle measurement was also used to determine hydrophilicity of the films after exposed to UV light. The results suggested that the TiO2 thin film at less than 40nm was amorphous. As the thickness was increased, the mixture of anatase and rutile phases of TiO2 began to form. By reducing the operating pressure during the film deposition, the rutile phase component can also be enhanced. Both the increased film thickness and decrease operating pressure were the critical factors to improve the hydrophilicity of the TiO2 thin films. Copyright © 2010 M. Horprathum et al.

Subject(s)

Critical factors
 Deposition time
 Field emission scanning electron microscopy
 Film deposition
 Film structure
 Glass slides
 Grazing-incidence X-ray diffraction
 Operating pressure
 Pulsed DC
 Rutile phase
 Rutile phasis
 TEM
 TiO
 Unheated substrates
 UV light
 Water contact angle measurement
 Amorphous films
 Angle measurement
 Contact angle
 DC power transmission
 Field emission
 Field emission microscopes
 Hydrophilicity
 Morphology
 Optical properties
 Oxide minerals
 Scanning electron microscopy
 Silicon wafers
 Spectroscopic ellipsometry
 Surface morphology
 Thin films
 Titanium dioxide
 Transmission electron microscopy
 Vapor deposition
 X ray diffraction
 Semiconducting silicon compounds

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URI

https://hdl.handle.net/20.500.14740/7544

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Scopus: Year 1983-2021

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