Publication: Texture development in Ti-Si-N nanocomposite thin films
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Issued Date
2006
Resource Type
File Type
application/pdf
ISSN
9215093
Other identifier(s)
2-s2.0-33748176481
Rights Holder(s)
มหาวิทยาลัยศรีนครินทรวิโรฒ
Bibliographic Citation
Materials Science and Engineering A. Vol 423, (2006), p.111-115
Suggested Citation
Chandra R., Kaur D., Chawla A.K., Phinichka N., Barber Z.H. Texture development in Ti-Si-N nanocomposite thin films. Materials Science and Engineering A. Vol 423, (2006), p.111-115. doi:10.1016/j.msea.2005.09.132 Retrieved from: https://hdl.handle.net/20.500.14740/5726
Author(s)
Abstract
Nanocomposite thin films of titanium silicon nitride were deposited by sputtering on R-plane sapphire substrates. The effects of silicon addition and negative substrate bias on the texture development of the films were studied systematically by varying the bias voltage in the range -20 to -200 V. The accompanying changes in the microstructure and growth morphology of the phases in these films were investigated in detail using X-ray diffraction and a atomic force microscopy. In addition, the effect of texture on the mechanical properties of the films was also investigated using nanoindentation technique. Pure TiN films deposited without Si exhibit a strong (1 1 1) preferred orientation, while with addition of Si, the orientation of the films changes from (1 1 1) to (2 0 0). Meanwhile the surface morphology of these films changed from a pronounced columnar microstructure to a dense, fine-grained structure. The effect of negative substrate bias voltage applied during deposition also resulted in a similar change of film orientation and microstructure and leads to the increase in hardness of the films from 21 to 40 GPa, respectively. © 2006 Elsevier B.V. All rights reserved.
Subject(s)
Atomic force microscopy
Crystal microstructure
Deposition
Indentation
Mechanical properties
Morphology
Sputtering
Surfaces
Textures
Thin films
Titanium compounds
X ray diffraction analysis
Growth morphology
Nanoindentation
Sapphire substrates
Titanium silicon nitride
Nanostructured materials
Atomic force microscopy
Crystal microstructure
Deposition
Indentation
Mechanical properties
Morphology
Nanostructured materials
Sputtering
Surfaces
Textures
Thin films
Titanium compounds
X ray diffraction analysis
Crystal microstructure
Deposition
Indentation
Mechanical properties
Morphology
Sputtering
Surfaces
Textures
Thin films
Titanium compounds
X ray diffraction analysis
Growth morphology
Nanoindentation
Sapphire substrates
Titanium silicon nitride
Nanostructured materials
Atomic force microscopy
Crystal microstructure
Deposition
Indentation
Mechanical properties
Morphology
Nanostructured materials
Sputtering
Surfaces
Textures
Thin films
Titanium compounds
X ray diffraction analysis