Publication:
Characterization of inhomogeneity in TiO2 thin films prepared by pulsed dc reactive magnetron sputtering

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Issued Date

2011

Resource Type

Article

File Type

application/pdf

ISSN

406090

DOI

10.1016/j.tsf.2011.07.064

Other identifier(s)

2-s2.0-80054034088

Rights Holder(s)

Scopus

Bibliographic Citation

Thin Solid Films. Vol 520, No.1 (2011), p.272-279

Suggested Citation

Horprathum M., Eiamchai P., Chindaudom P., Nuntawong N., Patthanasettakul V., Limnonthakul P., Limsuwan P. Characterization of inhomogeneity in TiO2 thin films prepared by pulsed dc reactive magnetron sputtering. Thin Solid Films. Vol 520, No.1 (2011), p.272-279. doi:10.1016/j.tsf.2011.07.064 Retrieved from: https://hdl.handle.net/20.500.14740/7225

Title

Characterization of inhomogeneity in TiO2 thin films prepared by pulsed dc reactive magnetron sputtering

Author(s)

Horprathum M.
 Eiamchai P.
 Chindaudom P.
 Nuntawong N.
 Patthanasettakul V.
 Limnonthakul P.
 Limsuwan P.

Abstract

This article discusses an analytical method for characterizations of TiO2 thin films and determinations of the degree of their inhomogeneity. The TiO2 films were prepared by a pulsed dc magnetron sputtering with an operating pressure as a main experimental parameter. The obtained films were primarily characterized for film crystallinity, microstructures and optical properties by spectroscopic ellipsometry. The measured ellipsometric data were analyzed by the single-, the double, and the triple-layer models in order to match with the inhomogeneous film structure proposed in the Thornton structure zone model. The results were then compared with those obtained from grazing-incidence X-ray diffraction, field-emission scanning electron microscopy and high-resolution transmission electron microscopy. The study revealed that the pulsed dc sputtered TiO2 films could be best described by the inhomogeneous triple-layer physical model. Although the films deposited at lower operating pressure had a dense structure with a mirror-like surface topography, the films deposited at higher operating pressure had the porous structure with the rough surface and the void. © 2011 Elsevier B.V.

Subject(s)

Analytical method
 Dense structures
 Ellipsometric data
 Experimental parameters
 Field emission scanning electron microscopy
 Film crystallinity
 Grazing incidence X-ray diffraction
 Inhomogeneities
 Inhomogeneous films
 Mirror-like surface
 Operating pressure
 Physical model
 Porous structures
 Pulsed DC
 Pulsed DC magnetron sputtering
 Rough surfaces
 Structure zone model
 TiO
 Transmission electron spectroscopy
 DC power transmission
 Electron spectroscopy
 High resolution electron microscopy
 High resolution transmission electron microscopy
 Optical properties
 Scanning electron microscopy
 Spectroscopic ellipsometry
 Surface topography
 Thin films
 Titanium
 Titanium dioxide
 Topography
 Transmission electron microscopy
 X ray diffraction
 Film preparation

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URI

https://hdl.handle.net/20.500.14740/7225

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Scopus: Year 1983-2021

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