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Atmospheric non-thermal argon-oxygen plasma for sunflower seedling growth improvement

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dc.contributor.author Matra K.
dc.date.accessioned 2021-04-05T03:21:50Z
dc.date.available 2021-04-05T03:21:50Z
dc.date.issued 2018
dc.identifier.issn 214922
dc.identifier.other 2-s2.0-85039997092
dc.identifier.uri https://ir.swu.ac.th/jspui/handle/123456789/12931
dc.identifier.uri https://www.scopus.com/inward/record.uri?eid=2-s2.0-85039997092&doi=10.7567%2fJJAP.57.01AG03&partnerID=40&md5=0fb8893d5056a641cdf950050597a4e1
dc.description.abstract Seedling growth enhancement of sunflower seeds by DC atmospheric non-thermal Ar-O2 plasma has been proposed. The plasma reactor was simply designed by the composition of multi-pin electrodes bonded on a solderable printed circuit board (PCB) anode. A stable plasma was exhibited in the non-periodical self-pulsing discharge mode during the seed treatment. The experimental results showed that non-thermal plasma treatment had a significant positive effect on the sunflower seeds. Ar-O2 mixed gas ratio, treatment time and power source voltage are the important parameters affecting growth stimulation of sunflower sprouts. In this research, the sunflower seeds treated with liters per minute (LPM) of Ar-O2 plasma at a source voltage of 8 kV for 1 min showed the best results in stimulating the seedling growth. The results in this case showed that the dry weight and average shoot length of the sunflower sprouts were 1.79 and 2.69 times higher and heavier than those of the untreated seeds, respectively. © 2018 The Japan Society of Applied Physics.
dc.subject Electrodes
dc.subject Plasma applications
dc.subject Plasma stability
dc.subject Printed circuit boards
dc.subject Discharge mode
dc.subject Growth stimulation
dc.subject Non-thermal plasma treatment
dc.subject Plasma reactors
dc.subject Printed circuit boards (PCB)
dc.subject Seedling growth
dc.subject Source voltage
dc.subject Sunflower seeds
dc.subject Electric discharges
dc.title Atmospheric non-thermal argon-oxygen plasma for sunflower seedling growth improvement
dc.type Article
dc.rights.holder Scopus
dc.identifier.bibliograpycitation Japanese Journal of Applied Physics. Vol 57, No.1 (2018)
dc.identifier.doi 10.7567/JJAP.57.01AG03


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