Please use this identifier to cite or link to this item: https://ir.swu.ac.th/jspui/handle/123456789/29544
Title: Description of electron mobilities in epitaxial lanthanum-doped barium stannate films: Influences of LO phonons, threading dislocation, and ionized donor defects
Authors: Thongnum A.
Issue Date: 2023
Publisher: American Institute of Physics Inc.
Abstract: Lanthanum-doped barium stannate (La-doped BaSnO3 or LBSO) has attracted the attention of researchers and engineers because of its wide range of potential applications in electronic and optoelectronic devices. This is due to a combination of its exceptional room temperature (RT) mobility of 320 cm2 V−1 s−1 and high visible range transparency. However, epitaxial LBSO films made using strategic deposition techniques such as molecular beam epitaxy, pulsed laser deposition, and magnetron sputtering show comparatively low RT mobilities, between 24 and 183 cm2 V−1 s−1, and an accurate description of these RT mobilities is still sought. Herein, we provide the underlying scattering mechanisms related to longitudinal optical (LO) phonons, threading dislocation, and ionized donor defects to elucidate the RT mobilities in LBSO epitaxial films. It was found that the total mobility estimated using Matthiessen's rule provided strong quantitative agreement with experimental results. The large polaron mobility based on LO phonon scattering dominated the whole spectrum of electron concentrations in this system. It was an upper bound mobility, i.e., the mobility limit attained at 320 cm2 V−1 s−1. The calculated mobility associated with LO phonon and threading dislocation scatterings adequately verified the experimental results between 150 and 183 cm2 V−1 s−1. The predicted results for all three scattering types were predominant in experimental data at less than 150 cm2 V−1 s−1. These investigations deepen our understanding of mechanisms governing the charge transport scattering in epitaxial LBSO films and pave the way for the development of novel semiconductor thin films for use in electronic and optoelectronic devices. © 2023 Author(s).
URI: https://www.scopus.com/inward/record.uri?eid=2-s2.0-85169843962&doi=10.1063%2f5.0163172&partnerID=40&md5=527cbcc30577c9c281fef61c187da773
https://ir.swu.ac.th/jspui/handle/123456789/29544
Appears in Collections:Scopus 2023

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