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Title: | Characterization and electrochemical properties of CuO–Cu2O@rGO nanocomposite synthesized by a seed-mediated growth process |
Authors: | Wongjom P. Tuichai W. Karaphun A. Phrompet C. Daengsakul S. Pimanpang S. Moontragoon P. Srepusharawoot P. Sriwong C. Ruttanapun C. |
Keywords: | Agglomeration Copper oxides Electric discharges Electrochemical electrodes Graphene High resolution transmission electron microscopy Nanocomposites Nanoparticles X ray diffraction analysis CuO–cu2O@reduced graphene oxide nanocomposite (CuO–cu2O@reduced graphene oxide NCP) Graphene oxide nanocomposites |
Issue Date: | 2022 |
Abstract: | A CuO–Cu2O@rGO nanocomposite (CuO–Cu2O@rGO NCP) has been successfully prepared through a seed-mediated growth process. X-ray diffraction (XRD) analysis results indicated a monoclinic phase of CuO–Cu2O@rGO NCP with space group C2/c. Transmission electron microscopy (TEM) revealed agglomeration of the CuO and Cu2O nanoparticles in the rGO sheet matrix. The interaction of CuO–Cu2O@rGO NPC resulted from the aggregation and overlapping of CuO and Cu2O nanoparticles owing to the influence of a seed-mediated growth process. The electrochemical properties of the CuO–Cu2O@rGO NPC electrode indicate the storage of energy at the surface through a pseudo-capacitive mechanism. The specific capacitance at a current density of 0.5 A g−1 and the average percentage capacity retention after 1000 cycles of a CuO–Cu2O@rGO electrode at a current density of 10 A g−1 were evaluated as 125.54 F g−1 and 89.87 ± 3.30%, respectively. In the CuO–Cu2O@rGO electrode, the incorporated rGO affects the electrical conductivity and the synergistic interactions in charge–discharge processes. Interestingly, these results showed that the material was synthesized through a seed-mediated growth process and reveal the key factors that determine the combination and volume expansion of the reversible redox transition between Cu+ and Cu2+ during charge–discharge processes. © 2021 Elsevier Ltd |
URI: | https://www.scopus.com/inward/record.uri?eid=2-s2.0-85121718209&doi=10.1016%2fj.jpcs.2021.110540&partnerID=40&md5=53fcc5d1d63cc1f5a59ce8d71b34adc6 https://ir.swu.ac.th/jspui/handle/123456789/27474 |
ISSN: | 223697 |
Appears in Collections: | Scopus 2022 |
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