Please use this identifier to cite or link to this item: https://ir.swu.ac.th/jspui/handle/123456789/14460
ชื่อเรื่อง: Characterization of inhomogeneity in TiO2 thin films prepared by pulsed dc reactive magnetron sputtering
ผู้แต่ง: Horprathum M.
Eiamchai P.
Chindaudom P.
Nuntawong N.
Patthanasettakul V.
Limnonthakul P.
Limsuwan P.
Keywords: Analytical method
Dense structures
Ellipsometric data
Experimental parameters
Field emission scanning electron microscopy
Film crystallinity
Grazing incidence X-ray diffraction
Inhomogeneities
Inhomogeneous films
Mirror-like surface
Operating pressure
Physical model
Porous structures
Pulsed DC
Pulsed DC magnetron sputtering
Rough surfaces
Structure zone model
TiO
Transmission electron spectroscopy
DC power transmission
Electron spectroscopy
High resolution electron microscopy
High resolution transmission electron microscopy
Optical properties
Scanning electron microscopy
Spectroscopic ellipsometry
Surface topography
Thin films
Titanium
Titanium dioxide
Topography
Transmission electron microscopy
X ray diffraction
Film preparation
วันที่เผยแพร่: 2011
บทคัดย่อ: This article discusses an analytical method for characterizations of TiO2 thin films and determinations of the degree of their inhomogeneity. The TiO2 films were prepared by a pulsed dc magnetron sputtering with an operating pressure as a main experimental parameter. The obtained films were primarily characterized for film crystallinity, microstructures and optical properties by spectroscopic ellipsometry. The measured ellipsometric data were analyzed by the single-, the double, and the triple-layer models in order to match with the inhomogeneous film structure proposed in the Thornton structure zone model. The results were then compared with those obtained from grazing-incidence X-ray diffraction, field-emission scanning electron microscopy and high-resolution transmission electron microscopy. The study revealed that the pulsed dc sputtered TiO2 films could be best described by the inhomogeneous triple-layer physical model. Although the films deposited at lower operating pressure had a dense structure with a mirror-like surface topography, the films deposited at higher operating pressure had the porous structure with the rough surface and the void. © 2011 Elsevier B.V.
URI: https://ir.swu.ac.th/jspui/handle/123456789/14460
https://www.scopus.com/inward/record.uri?eid=2-s2.0-80054034088&doi=10.1016%2fj.tsf.2011.07.064&partnerID=40&md5=519134b15acb8c98979f768dee5ff177
ISSN: 406090
Appears in Collections:Scopus 1983-2021

Files in This Item:
There are no files associated with this item.


Items in SWU repository are protected by copyright, with all rights reserved, unless otherwise indicated.