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dc.contributor.authorPlirdpring T.
dc.contributor.authorHorprathum M.
dc.contributor.authorEiamchai P.
dc.contributor.authorSamransuksamer B.
dc.contributor.authorChananonnawathorn C.
dc.contributor.authorBoonpichayapha T.
dc.contributor.authorKaewkao J.
dc.contributor.authorKaewkhao J.
dc.date.accessioned2021-04-05T03:24:39Z-
dc.date.available2021-04-05T03:24:39Z-
dc.date.issued2016
dc.identifier.issn10139826
dc.identifier.other2-s2.0-84958225596
dc.identifier.urihttps://ir.swu.ac.th/jspui/handle/123456789/13552-
dc.identifier.urihttps://www.scopus.com/inward/record.uri?eid=2-s2.0-84958225596&doi=10.4028%2fwww.scientific.net%2fKEM.675-676.289&partnerID=40&md5=2b9e41c1a44b4368fb8a8d41c1eb91a9
dc.description.abstractNanostructure TiO2 films were prepared by electron beam evaporation with glancing angle deposition technique at room temperature. The morphology, crystal structure and optical properties at various substrate rotation speeds (0-10 rpm) were investigated by field-emission scanning electron microscopy (FE-SEM), X-ray diffraction (XRD) and UV-vis spectrophotometer. The cross-section FE-SEM images illustrate that the nanostructures consist of different morphology: slanted columnar, spiral and vertical align nanorods at 0, 0.01 and 10 rpm-rotation speed, respectively. In particular, the rotation speed-controlled incoming vapor flux was found to play crucial role in the growth of nanostructure TiO2 films. © 2016 Trans Tech Publications, Switzerland.
dc.subjectCrystal structure
dc.subjectDeposition
dc.subjectEnamels
dc.subjectEvaporation
dc.subjectField emission microscopes
dc.subjectMorphology
dc.subjectNanorods
dc.subjectOptical properties
dc.subjectScanning electron microscopy
dc.subjectElectron beam evaporation
dc.subjectField emission scanning electron microscopy
dc.subjectGLAD
dc.subjectGlancing Angle Deposition
dc.subjectGlancing angle deposition technique
dc.subjectRotation speed
dc.subjectUV-Vis spectrophotometers
dc.subjectVarious substrates
dc.subjectTitanium dioxide
dc.titleGrowth of nanostructure TiO2 films by glancing angle deposition
dc.typeConference Paper
dc.rights.holderScopus
dc.identifier.bibliograpycitationKey Engineering Materials. Vol 675-676, (2016), p.289-292
dc.identifier.doi10.4028/www.scientific.net/KEM.675-676.289
Appears in Collections:Scopus 1983-2021

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