Please use this identifier to cite or link to this item: https://ir.swu.ac.th/jspui/handle/123456789/14420
Title: Biodegradation of all-in-one self-etch adhesive systems at the resin-dentin interface
Authors: Chiaraputt S.
Roongrujimek P.
Sattabanasuk V.
Panich N.
Harnirattisai C.
Senawongse P.
Keywords: Acetylcholinesterase
Adhesive layers
Aging process
Bonding interfaces
Collagenase
Hybrid layer
Lower bond strength
Micro-tensile bond strength
Nanoleakage
Nanoleakages
Resin-dentin interfaces
Scanning electron microscopes
Self-etch
Self-etch adhesives
Single bond
Adhesives
Biodegradation
Bond (masonry)
Bond strength (materials)
Degradation
Enzymes
Interfaces (materials)
Resins
Scanning electron microscopy
Biodegradable polymers
acetylcholinesterase
adhesive agent
Clearfil SE Bond
Clearfil Tri-S Bond
collagenase
dentin bonding agent
G-Bond
methacrylic acid derivative
resin
resin cement
tooth cement
chemistry
dental etching
human
materials testing
molar tooth
scanning electron microscopy
surgery
tensile strength
Acetylcholinesterase
Adhesives
Collagenases
Composite Resins
Dental Cements
Dental Etching
Dentin-Bonding Agents
Humans
Materials Testing
Methacrylates
Microscopy, Electron, Scanning
Molar
Resin Cements
Resins, Synthetic
Tensile Strength
Issue Date: 2011
Abstract: This study evaluated the effects of two exogenous enzymes on the resin-dentin interface. Collagenase (Col) and acetylcholinesterase (Ach) were used to simulate salivary enzymes and accelerate the aging process of the bonding interfaces. Four adhesives, Adper Single Bond 2 (SB), Clearfil SE Bond (SE), Clearfil tri-S Bond (S3) and G-Bond (G), were bonded to the dentin surfaces. After storage in water with collagenase or acetylcholinesterase, the specimens were examined using a microtensile bond strength test (MTBS). Nanoleakage patterns were observed with a scanning electron microscope (SEM). The MTBS results demonstrated significantly lower bond strengths in the groups stored with either enzyme than in water. SB exhibited severe degradation after exposure to collagenase, while G showed severe degradation after exposure to acetylcholinesterase. All of the self-etch systems (SE, S3 and G) exhibited water-tree patterns within the adhesive layer when immersed in water for three months. The etch-and-rinse system (SB) showed nanoleakage within the hybrid layer and the adhesive.
URI: https://ir.swu.ac.th/jspui/handle/123456789/14420
https://www.scopus.com/inward/record.uri?eid=2-s2.0-82855181111&doi=10.4012%2fdmj.2011-080&partnerID=40&md5=5760daedb59dafb2b4ec1471a018197d
ISSN: 2874547
Appears in Collections:Scopus 1983-2021

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